作者：TAKAMASA ISHIGAKI;
作者單位：Plasma Processing Group, Nano Ceramics Center, National Institute for Materials Science (NIMS)
刊名：Journal of the Technical Association of Refractories
ISSN：0285-0028
出版年：2007-01-05
卷：27
期：4
起頁：248
止頁：251
分類號：TQ175
語種：英文
關鍵詞：
內容簡介In the present paper, the characteristics of materials processing using RF induction thermal plasma have been described. The most important feature of the thermal plasma is a capability of stable generation even with the introduction of large amounts of powder and liquid precursor mists. The synthesis of functional nanoparticles with emphasis on the chemical control of the reaction atmosphere has been shown. Also, the best use of chemistry is indispensable in the choice and preparation of precursors. In order to extend the application of thermal plasmas for materials processing, highly precise control of plasma generation is desired. The present author has developed a new plasma generation method, called the pulse modulated inductively coupled plasma (PM-ICP). The PM-ICP method was able for the first time to disclose the chemical aspects of thermal plasma with the help of time-domain control. In this unique plasma processing, a large amount of enthalpy was suppressed to increase the use of high chemical reactivity, giving rise to the further extension of application areas of thermal plasma materials processing. Our Plasma Processing Group is aiming to synthesize functional materials by controlling the chemical reaction fields through plasma technology. Based on the development of plasma generation methods, we are working on the functionalization of nano-structured ceramic materials, such as the plasma synthesis of nano-scale particles of titanium oxide and diamond, the synthesis of oxide thin films by a pulse-modulated sputtering method and the fabrication of functional composite materials composed of highly dispersed nano-size particles. Further information can be found in our web page, http://www.nims.go.jp/plasma/.
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