作者：Rie ENDO, Md. Shakhawat H. FIROZ and Masahiro SUSA
作者單位：
刊名：Journal of the Technical Association of Refractories, Japan
ISSN：
出版年：2012-05-01
卷：32
期：4
起頁：
止頁：
分類號(hào)：
語種：英文
關(guān)鍵詞：Basicity, Refraction basicity, Electronic polarizability. Mould flux
內(nèi)容簡介Refraction basicity was applied as a measure of the basicity of mould flux at high temperature. Oxygen and fluorine ions have electron donation power in the mould flux. thus. the refraction basicity was defined as the average of electronic polarizabilities of oxygen and fluorine ions ((Xo and (Xp). First the refraction basicity was confirmed to be applicable for the measure of basicity of mould flux by comparison with the optical basicity for x mol% CaF2-5Na2O-6Al2O3-(89--x) (CaO.SiO2) at room temperature. In addition it was confirmed that the electronic polarizability of fluorine ion in calcium fluoride could be substituted for that of fluorine ion in the silicate system. Furthermore, it was suggested that the refraction basicity of mould flux at high temperature could express the reactivity between the mould flux and the immersion nozzle.
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