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題目作者分類號關鍵字作者單位刊名語言出版時間
Anti-clogging nozzle refractories composed of calcium zirconatedicalcium silicate-carbon for application in steel industry A.G.M. Othman;W.M.N. Nour;M.M.S. Wahsh;TQ175.7National Researche Centre, Refractories, Ceramics and Building materials Dept., Cairo, Egypt;National Researche Centre, Refractories, Ceramics and Building materials Dept., Cairo, Egypt;National Researche Centre, Refractories, Ceramics and Building materiThe Refractories Engineer英文2010-01-05
Multifunctional nanocomposite thin films by aerosol-assisted CVD Warwick, M.E.A.;Dunnill, C.W.;Binions, R.;TQ175AACVD;Nanocomposites;Thin films;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, Chemical vapor deposition英文2010-01-05
Deposition of large-area and protective diamond-like carbon coatings on glass substrates by low-pressure dielectric barrier discharges Niu, J.;Liu, D.;Ou, Y.;You, Y.;Yu, N.;TQ175Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, China;Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, China;Research Center for Optoelectronics, Dalian Nationalities University, DalChemical vapor deposition英文2010-01-05
Investigation of atmospheric pressure CVD-produced aluminum coatings for the protection of steel from corrosion Gu, S.;Maeng, S.;Suh, Y.;Levy, R.A.;Deavenport, D.L.;Gómez, F.J.;Newberg, S.S.;Brooman, E.W.;Berman, E.S.;Kleek, J.J.;Beatty, J.H.;Schwartz, A.S.;Gaydos, S.P.;TQ175Aluminum;APCVD;Corrosion protection;Step coverage;TIBAL;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 071Chemical vapor deposition英文2010-01-05
In-situ bulk electrophoretic separation of single-walled carbon nanotubes grown by gas-phase catalytic hydrocarbon decomposition Smovzh, D.V.;Maltsev, V.A.;Dittmer, S.;Zaikovsky, V.I.;Campbell, E.E.B.;Nerushev, O.A.;TQ175CNTs;Electrophoresis;Glow discharge;Hollow cathode;Plasma CVD;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Department of Physics, G?teborg University, 41296 G?teborg, SwedeChemical vapor deposition英文2010-01-05
Silicon carbonitride (SiCN) films by remote hydrogen microwave plasma CVD from tris(dimethylamino)silane as novel single-source precursor Wrobel, A.M.;Blaszczyk-Lezak, I.;Uznanski, P.;Glebocki, B.;TQ175Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular aChemical vapor deposition英文2010-01-05
Using precursor chemistry to template vanadium oxide for chemical sensing Beardslee, J.A.;Mebust, A.K.;Chaimowitz, A.S.;Davis-Vanatta, C.R.;Moersch, T.L.;Afridi, M.Y.;Taylor, C.J.;Leonard, H.;TQ175Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, PoChemical vapor deposition英文2010-01-05
Growth of [100]-textured gadolinium nitride films by CVD Brewer, J.R.;Gernhart, Z.;Liu, H.-Y.;Cheung, C.L.;TQ175Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0304, United States;School of Science, Buena Vista University, Storm Lake, IA 50588, United States;Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska Chemical vapor deposition英文2010-01-05
Mass analysis of growth of AL _2O _3 thin films from low-temperature atomic layer deposition on woven cotton Hojo, D.;Adschiri, T.;TQ175Aluminum oxide;Atomic layer deposition;Conformal coatings;Cotton;Three-dimensional structures;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, JapanChemical vapor deposition英文2010-01-05
[cis-(1,3-diene) _2W(CO) _2] complexes as MOCVD precursors for the deposition of thin tungsten - Tungsten carbide films Jipa, I.;Heinemann, F.W.;Schneider, A.;Popovska, N.;Siddiqi, M.A.;Siddiqui, R.A.;Atakan, B.;Marbach, H.;Papp, C.;Steinrück, H.-P.;Zenneck, U.;TQ175Diene complexes;MOCVD;Tungsten;Tungsten carbide;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM), Universit?t Erlangen-Nürnberg, Egerlandstrasse 1, D-91058 Erlangen, Germany;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM),Chemical vapor deposition英文2010-01-05

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